Canon噴墨式平坦化技術 為先進製程帶來成本革命 (2026.01.13)
長期以來，晶圓在多層堆疊過程中，表面會產生細微的起伏，這會導致光學曝光時出現失焦，進而造成電路缺陷。傳統上，業界依賴化學機械研磨（CMP）來磨平晶圓，但隨著製程邁向 2 奈米甚至更深層，CMP 的精度已逐漸遇到瓶頸。除了追求更精細的線寬，如…
搜尋「lithography process」，共 83 筆
雷射先進應用的最新趨勢與市場動態 (2025.07.11)
在全球製造業面臨淨零碳排與智慧製造雙重轉型之際，先進雷射技術正以其高精度、高效率、低能耗及非接觸式加工等顯著優勢，成為實現永續與高效生產的關鍵。…
Imec’s Virtual Fab Underpins Strategies to Reduce the Carbon Footprint of Lithography and Etch (2023.03.29)
At the 2023 Advanced Lithography + Patterning Conference, imec presents a quantitative assessment of the environmental i…
LEUVEN,Belgium— At the 2022 SPIE Advanced Lithography and Patterning Conference, imec presents significant progress in p…
Inkron, a Nagase Group Company, the global leader of siloxane-based, optically clear Nano-Imprint Lithography (NIL) mate…
Advanced state-of-the-art IC production at 5 nanometer dimensions will be a catalyst for strong growth in the semiconduc…
Imec demonstrates 24nm pitch lines with single exposure EUV lithography on ASML’s NXE:3400B scanner (2020.02.27)
This week, at the SPIE Advanced Lithography Conference, imec and ASML announce a breakthrough in printing narrow 24 nano…
Samsung Electronics today announced that its new cutting-edge semiconductor fabrication line in Hwaseong, Korea, has beg…
Semiconductor R&D To Nudge Higher Through 2024 (2020.02.03)
The semiconductor business is defined by rapid technological changes and the need to maintain high levels of investment …
HSINCHU, Taiwan –TSMC today announced its 6-nanometer (N6) process, which provides a significant enhancement of its indu…
Samsung Successfully Completes 5nm EUV Development (2019.04.16)
Samsung Electronics today announced that its 5-nanometer (nm) FinFET process technology is complete in its development a…
Samsung Electronics today announced that it has completed all process technology development and has started wafer produ…
IC Insights Forecasts DRAM Market Growth Will Cool (2018.10.03)
In its September Update to The 2018 McClean Report, IC Insights discloses that over the past two years, DRAM manufacture…
ANSYS獲三星晶圓代工自加熱、電源完整性和電子遷移解決方案認證 (2018.06.27)
ANSYS解決方案已獲三星晶圓代工部門（Samsung Foundry）電源完整性和可靠度分析認證與支援，這將有助雙方共同客戶製作可靠穩健的新一代電子元件。該認證支援三星晶圓代工部門最新7奈米（7LPP；7-nanometer Low Po…
Samsung Electronics announced that it broke ground on a new EUV (extreme ultraviolet) line in Hwaseong, Korea, aiming to…
ASML’s dominance in the semiconductor equipment market continued in 2017, according to the report “Sub-100nm Lithography…
Samsung Electronics today announced it has added 11-nanometer (nm) FinFET process technology (11LPP, Low Power Plus) to …
IBM, its Research Alliance partners GLOBALFOUNDRIES and Samsung, and equipment suppliers have developed an industry-firs…
GLOBALFOUNDRIES today announced plans to expand its global manufacturing footprint in response to growing customer deman…
Samsung Electronics announced that it is expanding its advanced foundry process technology offerings with the fourth-gen…